Ellipsometry is a non contact/non destructive technique that gives thickness and refractive index of thin transparent and semi transparent films to sub-angstrom precision.
It is commonly used to characterize single layer or multilayer stacks ranging from a few angstroms to several microns with an excellent accuracy.
It is a versatile and powerful optical technique that has applications in many different fields, from semiconductors to microelectronics and biology, from basic research to industrial applications. It helps to study and to monitor sample properties including morphology, crystal quality, chemical composition and electrical conductivity.